Development of a locally electron-heated plasma source

Abstract A new type high-density plasma source has been developed. It employs a 2.45-GHz microwave in combination with permanent magnets which surround microwave ports located in the chamber sidewall. Electron–cyclotron resonance regions are formed locally in front of the microwave ports. High-energy electrons are produced which diffuse into the center of the chamber along the lines of magnetic force. A cusp magnetic field is employed to confine the plasma. An ion saturation current density of 20 mA cm −2 within a uniformity of 5% over a 300 mm diameter is obtained.