Double-textured ZnO:Al films obtained by a one-step etching method for enhanced light trapping

Double-textured ZnO:Al (AZO) transparent conducting films with good optoelectronic characteristics and enhanced light trapping ability were prepared by a method including deposition, etching and re-deposition, and only one-step etching process was adopted during the whole process. The effects of the one-step etching method on the structural and optoelectronic properties, surface morphology and light trapping ability of double-textured AZO films were studied systematically. Double-textured films were covered with uniformly and distinctly crater-like textured structure after the re-deposition. And double-textured AZO films exhibited higher haze values compared with the single-textured films. Effective enhancement of light trapping was obtained from the double-textured AZO films by the one-step etching method.