Axial macro-micro adjusting device for optical element in photoetching projection objective lens system

The invention discloses an axial macro-micro adjusting device for an optical element in a photoetching projection objective lens system and relates to the technical field of deep ultraviolet projection photoetching objective lens structural design and adjustment. The axial macro-micro adjusting device aims at solving the problem that an existing optical element axial adjusting device is small in adjustment stroke and has tilt errors. The axial macro-micro adjusting device comprises capacitive sensors, a picture frame, a macro-micro adjusting mechanism and a guiding guide rail. The capacitive sensors are arranged above the picture frame and used for detecting the moving distance of the picture frame, the macro-micro adjusting mechanism is arranged below a frame of the picture frame and used for performing macro-micro adjustment on the picture frame, the guiding guide rail is arranged on the outer side of the frame of the picture frame and used for limiting movement of the picture frame, the picture frame comprises three bosses uniformly distributed in the circumferential direction and three guiding bosses, the capacitive sensors are arranged above the bosses, the macro-micro adjusting mechanism acts on the bosses, and the guiding bosses are matched with the guiding guide rail. According to the axial macro-micro adjusting device, large-stroke adjustment is achieved while adjustment accuracy is guaranteed; and a driving structure acts on the picture frame simultaneously, so that damage to the surface type of the optical element caused by adjustment force is reduced.