Multi-shot flash lamp annealing method for electroless-plated Ni-P film on UV-surface-modified ABS

ABSTRACTThe multi-shot flash lamp annealing (FLA) method as a rapid annealing technique was developed for an electroless-plated Ni-P film on UV-surface-modified acrylonitrile–butadiene-styrene (ABS) in place of the conventional annealing method. The new multi-shot FLA method continuously irradiates a Xe flash discharge with low irradiance (<1 J cm–2) with a frequency of 3 Hz. An adhesion strength between the electroless Ni-P film and ABS of more than 1.2 kN m–1 was achieved in a short time of approximately 30 s; this adhesion strength was larger than that obtained in the conventional method of 1 h duration. The etching effect of the FLA method was assessed by a study of the surface morphologies of the Ni-P films. XRD spectra of the Ni-P films showed an improvement in the crystallinity of the films. Considering surface elemental analyses of the peeled Ni-P-film/ABS, a cohesive failure, which implies high adhesion, was observed in the ABS. The proposed FLA method is expected to efficiently improve the adhes...