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Formation of an SiO2 film by thermal CVD of TEOS.The effect of additives.
Formation of an SiO2 film by thermal CVD of TEOS.The effect of additives.
1991
Shiga Satoshi
Ikuta Kazuyuki
Eto Yasuyuki
Komiyama Hiroshi
Handa Satoshi
Keywords:
Chemical substance
Operations research
Search engine
Process engineering
Engineering
thermal cvd
Nanotechnology
Science, technology and society
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