The barrier deposition film

Has a uniform film quality and film density provides a barrier deposition film having a dense initial barrier property high deposition layer. Barrier deposition film characterized by having deposited layer below the at least one surface of a substrate: (a) at least one layer. Deposited layer (a): a deposition layer having a thickness of 10~500nm made of a metal oxide, upon analysis of the vapor deposition layer in the depth direction by X-ray photoelectron spectroscopy (ESCA), a metal and oxygen (O) element ratio [oxygen (O) / metal] mean value 1.20 or more, the difference between the maximum value and the minimum value of 1.90 or less, and oxygen (O) / metal] is 0.35 or less