Method for holographically manufacturing surface Raman-enhanced substrate and photoetching system

The invention discloses a method for manufacturing a surface Raman-enhanced substrate and a photoetching system. Interference is generated by two coherent light beams, interference fringes of the coherent light are recorded on the surface of photoresist, and the cycle of an optical grating is precisely controlled by controlling the angle of the two light beams; then an embossment type optical grating is formed on the surface of the photoresist through real-time development; finally, a surface-enhanced Raman scattering metal active layer is plated on the surface of the optical grating by means of a plating device. The technical problem about obtaining the large-area periodic surface Raman-enhanced substrate by a simple method and device is solved.