Generation of intense vacuum ultraviolet radiations for advanced materials processing

We have been developing high intensity vacuum ultraviolet (VUV) laser system for advanced applications such as micro and precise processing and photochemical reactions. We propose and construct a new VUV laser system to generate an output energy of sub mJ with a pulse width of subpicosecond at the wavelength of 126nm. A seed pulse was generated in Xe as the 7th harmonics of a 882 nm Ti:sapphire laser, and the Ar2* amplifier media were generated in an optical-field-induced ionization Ar plasma produced by another 785 nm Ti:sapphire laser. The VUV radiation should be further amplified in a discharge-pumped Ar2* amplifier, which is under construction.We have been developing high intensity vacuum ultraviolet (VUV) laser system for advanced applications such as micro and precise processing and photochemical reactions. We propose and construct a new VUV laser system to generate an output energy of sub mJ with a pulse width of subpicosecond at the wavelength of 126nm. A seed pulse was generated in Xe as the 7th harmonics of a 882 nm Ti:sapphire laser, and the Ar2* amplifier media were generated in an optical-field-induced ionization Ar plasma produced by another 785 nm Ti:sapphire laser. The VUV radiation should be further amplified in a discharge-pumped Ar2* amplifier, which is under construction.