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Developing a systematic approach to metal gates and high-k dielectrics in future-generation CMOS
Developing a systematic approach to metal gates and high-k dielectrics in future-generation CMOS
2006
Prashant Majhi
H. C. Wen
Husam N. Alshareef
H. Rusty Harris
H.F. Luan
Kisik Choi
C. S. Park
Seung Chul Song
Byoung Hun Lee
Raj Jammy
Keywords:
Parallel computing
Computer science
Dielectric
High-κ dielectric
CMOS
Metal
Engineering physics
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