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In situ synchrotron measurements of surface compensation mechanisms in La 0.6 Sr 0.4 Co 0.2 Fe 0.8 O 3-δ thin films
In situ synchrotron measurements of surface compensation mechanisms in La 0.6 Sr 0.4 Co 0.2 Fe 0.8 O 3-δ thin films
2010
Tim Fister
S. O. Hruszkewycz
Dillon D. Fong
Jeffrey A. Eastman
Paul H. Fuoss
Hui Du
Paul A. Salvador
Keywords:
Analytical chemistry
Materials science
Thin film
In situ
Synchrotron
Correction
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