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酸窒化技術を使った高性能・高信頼の Deep Sub-micron CMOS-FET
酸窒化技術を使った高性能・高信頼の Deep Sub-micron CMOS-FET
1999
kiyosi irino
yasuyuki tamura
satosi ookubo
tosirou nakanisi
mayumi sigeno
Jianyirishu Gu
masahiko higasi
tetuo fukuda
kongou takasaki
Keywords:
Micrometre
CMOS
Electronic engineering
Materials science
Optoelectronics
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