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Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
2008
Hyungseok Hong
Seokhoon Kim
Sanghyun Woo
Hyung-Chul Kim
Honggyu Kim
Wooho Jeong
Sunyeol Jeon
Seokhwan Bang
Seungjun Lee
Hyeongtag Jeon
Keywords:
Nuclear magnetic resonance
Physics
Metal
Remote plasma
Remote sensing
Optoelectronics
Condensed matter physics
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