Graded barrier AlGaN/AlN/GaN heterostructure for improved 2-dimensional electron gas carrier concentration and mobility

This paper presents an approach of compositional grading of the barrier in AlGaN/GaN quantum well heterostructure to achieve high two dimensional electron gas (2DEG) carrier concentration and mobility for RF power amplifier applications. Plasma assisted Molecular Beam Epitaxy (PAMBE) has been used to grow compositionally graded AlGaN/GaN and AlGaN/AlN/GaN heterostructures. In-situ cathodoluminescence (CL) and ex-situ high resolution x-ray diffraction (HRXRD) along with high resolution transmission electron microscopy (HRTEM) techniques were used to study the compositions and thicknesses of grown heterostructures. Ohmic contact formation for all the samples were found to be challenging due to unusual surface behavior and thus addressed with three different metallization schemes. The graded AlGaN/GaN and AlGaN/AlN/GaN heterostructures show 2DEG carrier concentrations of 2.0 × 1013 cm−2 and 2.3 × 1013 cm−2 with carrier mobility of 764 cm2v−1s−1 and 960 cm2v−1s−1, respectively at room temperature. A performance index has been proposed to correlate the obtained results with its suitability for particular RF applications. Open image in new window