Nanoscale laser writing of Indium-Tin-Oxide nanowires

In this study we report on sub-wavelength nanostructuring of sputtered Indium-Tin-Oxide (ITO) films using a high-repetition rate near-infrared Ti:Sapphire laser system based on a 85 MHz, sub-10 fs resonator. Our experiments demonstrate that cuts as small as 20 nm in width can be generated by ablation. ITO nanowires ranging in size down to 50 nm were produced by laser writing at radiant exposure below the ablation threshold followed by etching in hydrochloric acid. The dependence of the minimum structure size on irradiation and material parameters as well as the electrical properties of the nanowires were investigated.