Advanced testing requirements of diffractive optical elements for off-axis illumination in photolithography
2009
The progress of immersion lithography toward the 22nm production node is putting more stringent requirements on the
diffractive optics that are used for off-axis illumination. Tighter tolerances on pole balance, stray light, zeroth order,
optical transmission, and matching of the far field output pattern to the design specification are in-turn requiring more
accurate and repeatable optical testing. This paper will report on preliminary results from Tessera's new excimer
diffractive optics test stand, including gauge capability and sources of variation, ending with a comparison of
measurement capability to the required specifications.
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