Effect of optical lithography patterning on the crystalline structure of tunnel junctions

The crystalline structure of metal-oxide-based magnetic tunnel junctions patterned by optical lithography was resolved locally using a microfocused x-ray spot. We evidence several micron-sized lithography-induced distortion effects on the crystalline structure of the layers near the edges of the junction. The distortions translate into tilts (up to 1°) of the crystalline planes in the vicinity of the edges and propagate toward the center of the junction. They are attributed to the release of the elastic strain in the layers during the lithographical process. For the smallest junctions, size effects limiting the amplitude of the tilt are also evidenced.