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High-Speed Etching of Silicon Carbide Wafer Using High-Pressure SF6 Plasma
High-Speed Etching of Silicon Carbide Wafer Using High-Pressure SF6 Plasma
2021
Yasuhisa Sano
koki tajiri
Yuki Inoue
Risa Mukai
Yuma Nakanishi
Satoshi Matsuyama
Kazuto Yamauchi
Keywords:
Etching
Materials science
Optoelectronics
Plasma
high pressure
Silicon carbide
Wafer
Correction
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