A Diffraction System with an X‐ray Beam of a Band of Wavelengths

2004 
New diffraction system has been constructed at the Synchrotron Radiation Center at Ritsumeikan University, in which a parallel X‐ray beam of a band of wavelengths is produced by reflection from a multilayer monochromator of depth‐graded thicknesses. The band width is 0.013 nm and the useful wavelength range is from 0.16 nm to 0.20 nm. Diffraction patterns were taken from a single crystal of an enantiomorphous ferrocene‐derivative compound employing an Imaging Plate as a detector. Bragg reflections are seen elongated with a characteristic intensity profile due to anomalous dispersion. Bijvoet pair of reflections show a clear difference in the profile on the short wavelength side of the absorption edge and distinction between the enantiomers can be made more easily than the classical method based on the comparison of integrated intensities.
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