Production of Inductively Coupled RF Plasma Using a Ladder-Shaped Antenna

A radiofrequency (RF) excited H 2 plasma is produced using a ladder-shaped antenna which is positioned within a plasma chamber and the fundamental characteristics of the plasma are examined. The potential and current fed to the antenna are almost in phase. The plasma parameters are measured as a function of RF power, gas pressure and gas flow rate with a Langmuir probe. It is found that the plasma density is uniform within ±10% over 300 mm. Furthermore, increases in the frequency of the RF power source lead to increases in the plasma density. When a mesh grid is installed between the antenna and the substrate, the plasma density and the plasma potential decrease.