High Precision Measurement Of Phosphorus In Thin Glass Films Using X-Ray Fluorescence

Use of sapphire substrates instead of silicon for measurement of phosphorus in BPSGs and PSGs can improve the precision of the phosphorus measurement from 3σ = 0.32 wt.% to 3o = 0.05 wt.%. Improvement in precision results from elimination of the background silicon counts, elimination of film thickness as a factor in phosphorus calculations, use of peak intensity ratios rather than absolute intensities, and elimination of wafer reloading effects.