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Influence of high dose ion implantation of B and P on the state of the Si(111) surface
Influence of high dose ion implantation of B and P on the state of the Si(111) surface
2002
A. S. Rysbaev
S. S. Nasriddinov
M.T. Normuradov
B.E. Umirzakov
Keywords:
Ion implantation
Ion
Silicon
Semimetal
Analytical chemistry
Annealing (metallurgy)
Charged particle
Materials science
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