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Structural, composition, and electrical properties of novel ultra-thin high-K gate dielectrics
Structural, composition, and electrical properties of novel ultra-thin high-K gate dielectrics
2000
H. R. Schulte
B. W. Busch
Serdar Sayan
Andrey B. Ermakov
Robert Pfeffer
T. Gustafsson
Eric L. Garfunkel
Keywords:
Scanning probe microscopy
Dielectric
Thin film
Leakage (electronics)
High-κ dielectric
X-ray photoelectron spectroscopy
Materials science
Analytical chemistry
X-ray crystallography
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