Synthesis of indium-catalyzed Si nanowires by hot-wire chemical vapor deposition

Abstract Indium (In) catalyzed silicon nanowires (SiNWs) were synthesized by using hot-wire chemical vapor deposition (HWCVD) technique. Indium droplets were deposited on Si substrates by hot-wire evaporation of In wire, which was immediately followed by the growth of SiNWs from the droplets. Three sets of samples were prepared by varying the length of In wires, l , as 3, 1 and 0.5 mm. The sizes of In catalyst droplets decreased from 271.4 ± 66.8 to 67.4 ± 16.6 nm when the l was reduced from 3 to 0.5 mm. Larger size of In droplets (271.4 ± 66.8 nm) was found to induce the growth of worm-like NWs. The decrease in size of In catalyst droplets induced the formation of aligned and tapered NWs with smaller tips. The smallest value of tapering parameter, T p of 40.5 nm/μm is correlated to the SiNWs induced by the smallest size of In droplets (67.4 ± 16.6 nm). The as-grown SiNWs showed high purity and good crystalline structure.