Pulsed MO CVD Processes of MgO Layer Deposition from Mg(thd)2

There are many works in which MgO layers were obtained by means of MO CVD using various precursors [1]. Success in obtaining high-quality layers is first of all determined by the choice of a proper precursor on the basis of knowledge of its physicochemical properties [2]. In this connection, special attention is paid in the present work to the multi-aspect investigation of thermal characteristics and the processes of decomposition of the classical precursor Mg(thd)2.