Fabrication of Arrays of High Quality Quantum Filaments by Deep UV Holography and MBE Growth on Channelled Substrates

Deep UV (λ=257 nm) holographic lithography is greatly improved by the application of an antireflective coating and a negative (chemical amplification) resist. Deep 90 nm period gratings and smallest feature sizes of 40 nm are transfered by dry etching to the substrate. Molecular beam epitaxial growth on finely channeled substrates allows us to fabricate high density arrays of buried GaAlAs quantum wires (filaments) (QF) with an optical quality comparable to flat quantum wells. Orientation of the grating lines along the [011] direction is shown to be the most suited for QF with very small lateral dimensions.