Reconciling Resist Resolution Metrics

1. Title: 2. Full n a m e s of all authors: I 3. For all authors: C o m p a n y affiliation, e-mail, phone number, fax number, mailing address Reconciling Resist Resolution Metrics G r e g g M. Gallatin,(1) Christopher N. Anderson,(2) and Patrick P. Naulleau(3) (1) Applied Math Solutions, L L C ggallatin@charter.net 203-426-1911 ( F A X ) 6 C a s t l e L a n e , Newtown, C T 06470 (2) Lawrence Berkeley National L a b cnanderson@lbl.gov 1-510-486-4550 (fax) 1 Cyclotron R d , Berkeley, C A 94720 (3) Lawrence B e r k e l e y National L a b PNaulleau@lbl.gov 1-510-486-4550 (fax) 1 Cyclotron R d , Berkeley, C A 94720 6. Presentation preference: oral poster 7. Abstract body: R e s i s t resolution is a n important p a r a m e t e r a n d v a r i o u s m e t h o d s for determining the intrinsic resolution of resist h a v e b e e n d e v e l o p e d a n d e v a l u a t e d ( C . N . A n d e r s o n , et. a l . , E U V L S y m p o s i u m , S a p p o r o , J a p a n , 2 0 0 7 ) . Ideally the resolution d e t e r m i n e d using t h e s e metrics s h o u l d , to within a n overall c o n s t a n t s c a l e factor, m a t c h the resist blur determined f r o m fitting L E R d a t a to the analytic form of the r o u g h n e s s p o w e r s p e c t r a l density ( P S D ) . Indeed c o m p a r i s o n of the P S D d e t e r m i n e d blur to the contact hole resolution metric d o s h o w g o o d qualitative a g r e e m e n t for a w i d e s e t of r e s i s t s . Unfortunately the quantitative a g r e e m e n t is not a s g o o d a s o n e would d e s i r e . In this talk w e review the d a t a , s h o w how the d e p r o t e c t i o n blur radius c h a n g e s with the deprotection rate e v e n if the a c i d diffusion range is fixed a n d e v a l u a t e whether this effect c a n a c c o u n t for the quantitative difference in resolution d e t e r m i n e d u s i n g different t e c h n i q u e s . Finally, it s h o u l d be noted that the diffused aerial i m a g e a p p r o a c h to modeling resist b e h a v i o r is n o w in wide u s e a n d having the p r e c i s e s h a p e of the d e p r o t e c t i o n blur for a given resist is crucial for obtaining a c c u r a t e predictions of C D and L E R u s i n g this approach.