Charge trapping memory structures with Al2O3 trapping dielectric for high-temperature applications

Abstract Charge trapping memory structures with Al 2 O 3 dielectrics as a trapping dielectric are investigated in a metal–Al 2 O 3 –oxide–silicon configuration with a metal gate of high work function. The devices show very good write/erase characteristics, endurance, retention and disturb behaviour. At elevated temperature, devices with an Al 2 O 3 trapping layer are found to have better retention properties than devices with a silicon nitride trapping layer.