Film deposition equipment

The invention relates to film deposition equipment, which comprises a reaction cavity, an excitation power supply and a variable capacitor; the reaction cavity comprises a bearing apparatus and a target material, the target material is arranged at top of the reaction cavity and is electrically connected to the excitation power supply; the bearing apparatus is arranged in the reaction chamber and is positioned at a part corresponding to the target material for bearing a substrate; one end of the variable capacitor is connected to the bearing apparatus, and the other end is connected to ground. The film deposition equipment can control the deposition rate of the film deposited on the substrate by changing the capacitance value of the variable capacitor; under the controlled different film deposition rates, the performance of the film deposited on the substrate is essentially constant.