Customizing proximity correction for process-specific objectives

Proximity correction compensates systematic distortions of fabricated integrated circuit structures by providing 'inverse' distorted feature shapes on the mask pattern. Nominally, the 'best' correction might be an inverse shape that minimizes residual deviation at every point in the fabricated feature. However, depending upon the application, the optimum correction may not be defined in such simple terms. In this paper we will discuss methods for optimizing proximity corrections for different fabrication ofjectives and constraints.© (1996) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.