High-coherence QWS gratings for optoelectronic devices: why spatial-phase-locked e-beam lithography is necessary

A new technology called spatial-phase-locked electron-beam lithography (SPLEBL) has been developed to permit the fabrication of an integrated resonant channel-dropping filter1 (RCDF) (see Fig. 1) and other diffraction-based integrated-optical components. SPLEBL2 combines the fidelity of a holographically produced grating with the flexibility and resolution of e-beam lithography (EBL) for writing high-fidelity grating-based patterns with both short- and long-range spatial coherence.