Old Web
English
Sign In
Acemap
>
Paper
>
Design of High-k Interfacial Layer Formation by Cycle-by-Cycle Deposition and Annealing Method
Design of High-k Interfacial Layer Formation by Cycle-by-Cycle Deposition and Annealing Method
2009
Arito Ogawa
Kunihiko Iwamoto
Hiroyuki Ota
Masashi Takahashi
Akito Hirano
Toshihide Nabatame
Akira Toriumi
Keywords:
High-κ dielectric
Annealing (metallurgy)
Inorganic chemistry
Materials science
Deposition (law)
Chemical engineering
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
3
Citations
NaN
KQI
[]