Correlation between X-Ray Reflectivity and Rutherford Backscattering Spectroscopy for Density Measurement of Thin Films

The film density of nickel was examined by means of X-ray reflectivity measurement and Rutherford backscattering spectroscopy (RBS). The Ni thin film was deposited by electron beam evaporation in a high-vacuum system and was annealed to change its density. The density of the as-deposited film was 7.8±0.1 g/cm3. A good correlation between the X-ray reflectivity measurement and RBS was demonstrated.