Subwavelength microstructures fabrication by self-organization processes in photopolymerizable nanocomposite

This paper describes our research results on nanometers sizes subwavelength nanostructure fabrication by UV curing of special nanocompositematerial with self-organization and light self-focusing effects. For this purpose, special UV curable nanocomposite material with a set of effects was developing: light self-focusing in the photopolymer with positive refractive index change, self-organization based on photo-induced nanoparticles transportation, and oxygen-based polymerization threshold. Both holographic and projection lithography writing methods application for microstructure making shows geometrical optical laws perturbation as result of nanocomposite self-organization effects with formation of nanometers-sized high-aspect-ratio structures. Obtained results will be useful for diffraction limit overcoming in projection lithography as well as for deep lithography technique.