Confined-plume chemical deposition

Abstract Confined-plume chemical deposition (CPCD) is a single-step process for preparing microtextured coatings of ceramics, semiconductors, or metals on hard, soft, or biological tissue substrates. Pulsed-laser irradiation, generated by a free-electron laser or infrared/visible table-top lasers, of appropriately chosen molecular precursors layered onto solid supports under conditions of physical confinement initiates reaction plume formation at the laser/precursor interface. By scanning a pulsed-laser beam over specimen assemblies having a light-transmissive top plate, plume formation travels with the path of the light beam, and subsequent rapid cooling of plume components nucleates deposition and growth of highly textured microcrystalline coatings. Optimization of experimental parameters ensures that up to 95% of laser pulse energy is absorbed by precursor deposition, thereby minimizing collateral thermal damage to substrate materials. The historical development of CPCD will be summarized emphasizing the general scope of this coatings methodology. Recent results relevant to selected potential applications and a comparison of CPCD to laser chemical vapor deposition will also be included.