Development of hard-mask resist materials in nanoimprint lithography
2011
Hard mask resist material on photoreactive underlayer material was investigated to modify the film surface chemical
adhesion between resist material and photoreactive underlayer material during ultraviolet irradiation of nanoimprint
lithography. This procedure is proven to be suitable for resist material design and the process conditions of ultraviolet
curing nanoimprint lithography for the reduction of defect numbers by template contamination when the template was
removed from the hard mask resist after ultraviolet irradiation. The developed hard mask type silicon resist material with
ultraviolet crosslinking epoxy groups produced high resolutions (80 nm) at a good aspect ratio, and excellent patterning
dimensional accuracy by the replication (number of cycles: 32). The newly resist material and the process conditions are
expected as one of the defect less nanoimprint lithographic technologies in next generation electronic devices.
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