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Anomalous damage behaviour of BF 2 + implantation in silicon
Anomalous damage behaviour of BF 2 + implantation in silicon
1995
Lin Chenglu
Li Xiaoqin
Zhou Zuyao
Yang Genqing
Zou Shichang
P.L.F. Hemment
Keywords:
Semimetal
Ion implantation
Microscopy
Scattering
Atmospheric temperature range
Molecular physics
Materials science
Electron microscope
Transmission electron microscopy
Silicon
Correction
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