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Improvement of Etching Process Distribution Controllability within a Wafer by Multi Gas Injection System
Improvement of Etching Process Distribution Controllability within a Wafer by Multi Gas Injection System
2017
Isao Mori
Motohiro Tanaka
Tetsuo Kawanabe
Soichiro Eto
Naoki Yasui
Keywords:
Controllability
Etching
Reactive-ion etching
Wafer
Chemistry
Analytical chemistry
Optoelectronics
Correction
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