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Electrical Activation of Boron in Si Film Using Excimer Laser Annealing
Electrical Activation of Boron in Si Film Using Excimer Laser Annealing
2009
Takashi Noguchi
Kenji Kawai
Tomoyuki Miyahira
Toshiharu Suzuki
Masateru Sato
Keywords:
Annealing (metallurgy)
Excimer laser
Nuclear magnetic resonance
Hall effect
Physics
Boron
Electrical resistivity and conductivity
Conductivity
Condensed matter physics
Optoelectronics
excimer laser annealing
Correction
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