Pre-plating layer auxiliary preparation method of X-ray flash conversion screen with micro-column structure CsI (Tl) and application thereof

The invention relates to a pre-plating layer auxiliary preparation method of an X-ray flash conversion screen with a micro-column structure CsI (Tl) and an application of the conversion screen. The method comprises the following steps of: preparing a pre-plating layer by a thermal evaporation technology, realizing the pre-plating layer with uniformly distributed island grain structure and effectively controlling the grain distance through the adjustment of the thickness of the pre-plating layer, an annealing technology and the like, then preparing subsequent flash thin film on a substrate plated with the pre-plating layer by using CsI (Tl) powder as a raw material by the thermal evaporation, and realizing the effective controls on micro-column morphology, uniformity, line width, preferred orientation of a crystal face of the conversion screen and the like. The flash micro-column which is nearly vertical to a screen surface and has good crystallization property can guide flare light to spread along the direction of the micro-column, so that the spatial resolution of an X-ray image device is improved, and requirements on the high spatial resolution and high detection efficiency are met. The coupling of the X-ray flash conversion screen with the micro-column structure CsI (Tl) and a photoelectric detector can be applied to a digital X-ray imaging of high resolution. The pre-plating layer auxiliary preparation method of an X-ray flash conversion screen with the micro-column structure CsI (Tl) is suitable for industrial production and is high in popularization and application values.