Nitriding of titanium in rarefied activated nitrogen

Use of an hf discharge enables the rate of nitriding of titanium to be increased and the physicomechanical characteristics of the surface layer to be improved. The reaction of active nitrogen with titanium comprises three stages: formation of a surface TiN film, growth in the latter's thickness with the simultaneous formation of an α-solid solution, and annealing of the TiN phase.