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Wet Chemical Processing of Ge in Acidic H2O2 Solution: Nanoscale Etching and Surface Chemistry
Wet Chemical Processing of Ge in Acidic H2O2 Solution: Nanoscale Etching and Surface Chemistry
2020
Graniel Harne A. Abrenica
Mathias Fingerle
Mikhail V. Lebedev
Sophia Arnauts
Thomas Mayer
Frank Holsteyns
Stefan De Gendt
Dennis H. van Dorp
Keywords:
Etching
Nanotechnology
Materials science
Nanoscopic scale
Correction
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