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Improvement of surface flatness using H 2 etching in N-polar AlN
Improvement of surface flatness using H 2 etching in N-polar AlN
2019
Ryota Sakamoto
Tatuya Isono
Tadatoshi Ito
Kazuya Ataka
Hiroshi Kawamura
Narihito Okada
Kazuyuki Tadatomo
Keywords:
Polar
Etching
Flatness (systems theory)
Optoelectronics
Materials science
surface flatness
Correction
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