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Ultra-Shallow extensions for industrial 0.15 um CMOS technology fabricated using Plasma Doping
Ultra-Shallow extensions for industrial 0.15 um CMOS technology fabricated using Plasma Doping
1999
Lenoble.
Alieu
Grouillet
Haond
Felch
Goeckner
Fang
Keywords:
Optoelectronics
Doping
CMOS
Plasma
Materials science
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