A coating apparatus for coating a substrate at atmospheric conditions

The present invention describes a coating apparatus for coating a substrate at atmospheric conditions and a method for the modification of substrate surfaces at atmospheric conditions. The object of the invention to provide an atmospheric pressure flow reactor or a coating apparatus, is or are designed so that a homogeneous film deposition is possible in a in comparison with the prior art considerably extended parameter field, and that a markedly increased flexibility in reference is sent on the use of different coatings and coating systems. The coating device comprises a fixedly arranged plasma source, relative to the plasma source in a first movement direction (feed direction) movable substrate carrier, which on a side facing the plasma source side is formed for supporting and transporting a substrate to be coated and a (relative to the plasma source in a second direction of movement B2) which at least partially corresponds to the first movement direction, movable discharge device for the plasma of the plasma source, the exit means comprises at least one exit opening on. The outlet device is arranged and movable along the second direction of movement, that via the at least one outlet opening plasma from the plasma source towards the substrate surface can be directed.