Ion implantation for large-area optoelectronics on glass substrates

Abstract The authors have investigated the possibility of large-area optoelectronics on glass substrates fabricated by ion implantation, particularly AM-LCD (active-matrix liquid crystal display) and highly intelligent functional devices. Basic knowledge and technologies have been obtained for the formation of SiON- and PSG-layer underneath the glass surfaces by ion implantation. These layers can prevent sodium diffusion into the optoelectronic devices fabricated on glass substrates. Planarization of glass surfaces by ion implantation and the crystallization of amorphous Si by ion implantation without external heating are also discussed.