One kind tft array substrate and manufacturing method thereof

The present invention discloses a method of manufacturing the TFT array substrate, a TFT array substrate comprising: a substrate; a gate located on a substrate; a gate insulating layer, located above the gate electrode and the substrate; a semiconductor layer, a gate insulating layer is located above; a pixel electrode, a gate insulating layer is located over the engraved; source and drain electrodes, located over the semiconductor layer and a pixel electrode; a passivation layer, located above the source and drain electrodes; the TFT array substrate further includes a conductive terminal the first terminal electrode includes a first electrically conductive electrode and a second electrode disposed stacked, a first electrode is located below the second electrode through the contact hole of the passivation layer exposing the second electrode, since the present invention is disposed below the second electrode when carrying out the second through-hole can be etched to form the second electrode of the compensation here, even in the case where the second electrode is etched or engraved too light, but also to ensure the performance of the TFT array. The present invention also provides a method for producing the TFT array substrate of the TFT array substrate.