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Self-aligned-TiSi2 bottom contact with APM cleaning and post-annealing for sputtered-MoS2 film
Self-aligned-TiSi2 bottom contact with APM cleaning and post-annealing for sputtered-MoS2 film
2021
Satoshi Igarashi
Yusuke Mochizuki
Haruki Tanigawa
Masaya Hamada
Kentaro Matsuura
Iriya Muneta
Kuniyuki Kakushima
Kazuo Tsutsui
Hitoshi Wakabayashi
Keywords:
Composite material
post annealing
Materials science
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