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An Optimized Half Micron Device Using The Double-Implanted Lightly Doped Drain/Source Structure
An Optimized Half Micron Device Using The Double-Implanted Lightly Doped Drain/Source Structure
1982
Ogura
Codella
Rovedo
Shepard
Riseman
Keywords:
source structure
Doping
Optoelectronics
Materials science
Correction
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