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Characteristics of Thin-Body Channel SOI MOSFETs by using Two Step Elevated Silicon Eptaxtial Process
Characteristics of Thin-Body Channel SOI MOSFETs by using Two Step Elevated Silicon Eptaxtial Process
2008
K. Ishikawa
Toshiaki Iwamatsu
Takashi Terada
Hidekazu Oda
Y. Inoue
Keywords:
Silicon on insulator
Electronic engineering
Silicon
Materials science
Communication channel
thin body
Optoelectronics
two step
Correction
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