The method of processing a surface of polycrystalline silicon and a method of processing the substrate surface

The present invention provides a surface micromachined polysilicon species and a method of processing the substrate surface. Polysilicon surface processing method comprising: a surface micromachined polysilicon process using chemical mechanical polishing; wherein, prior to processing technology using chemical mechanical polishing the polysilicon surface, the SiNx film is deposited on the polysilicon surface. Polysilicon surface after the machining process of the present invention to achieve the level of roughness of less than 6nm.